清洗機產(chǎn)品及廠家
最新技術的兆聲和清洗技術的發(fā)展，對mems和半導體等領域的晶圓和掩模版清洗提供了最新的水平，可以幫助用戶獲得最干凈的晶圓片和掩模版。
更新時間:2025-08-21
最新技術的兆聲和清洗技術的發(fā)展，對mems和半導體等領域的晶圓和掩模版清洗提供了最新的水平，可以幫助用戶獲得最干凈的晶圓片和掩模版。
更新時間:2025-08-21
產(chǎn)品用途：采用脈沖式增壓清洗方式，除去吸嘴內壁中的污垢。工作原理：通過高壓射流技術，細微的水霧顆粒連續(xù)加壓將水碎化，產(chǎn)生約3-10um顆粒的水霧，以音速（v=360m/s)形成強大的脈沖式動能噴射到吸嘴上，每秒可達30次脈沖頻率，在待清洗的吸嘴上方形成一個持續(xù)的能量場，粉碎表面和內部的污垢，達到之清洗目的。測量范圍：-50-1050（℃）測溫分辨
更新時間:2025-08-20
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